Hitachi Regulus 8230 FE-SEM

• A newly designed CFE electron gun provides enhanced beam stability and higher probe current, supporting both ultra-high-resolution imaging and high-current analytical applications.
• Optimized low landing voltage operation allows clear visualization of fine surface features while reducing charging effects and minimizing thermal or beam damage to sensitive samples.
• Magnification of up to 2,000,000× enables detailed characterization of nanoscale structures and surface morphology.
• Equipped with Top, Upper, Lower, and YAG-BSE detectors, the microscope acquires complementary information related to surface morphology, compositional contrast, and material characteristics.
• Compatible with high-performance energy-dispersive X-ray spectroscopy (EDX) and electron backscatter diffraction (EBSD) systems, allowing simultaneous morphological, elemental, and crystallographic characterization.

The Hitachi Regulus 8230 FE-SEM is designed for high-resolution imaging and localized microstructural characterization across a wide range of materials. It enables detailed visualization of surface morphology, fracture features, coating structures, particle characteristics, and microstructural changes, while integrated EDX analysis provides accurate elemental identification and compositional distribution analysis.

By combining advanced low-voltage imaging, high spatial resolution, and integrated analytical capabilities, the system delivers comprehensive insights into material structures and properties at the micro- and nanoscale. It supports a variety of applications, including semiconductor analysis, nanomaterial research, advanced polymer characterization, metal and alloy evaluation, ceramic studies, battery material development, and failure analysis, helping researchers and engineers achieve reliable material assessment and process optimization.