Shimadzu, Kratos Axis Supra+ XPS

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The Shimadzu Kratos AXIS Supra+ X-ray Photoelectron Spectroscopy (XPS) System is an advanced surface analysis platform that integrates high-performance XPS spectroscopy, chemical imaging, and intelligent automation capabilities. By providing quantitative elemental composition and chemical state information from the outermost approximately 10 nm of material surfaces, the system enables precise investigation of surface chemistry, chemical bonding, and interface phenomena across a broad range of materials.

Building on its powerful spectroscopic capabilities, the AXIS Supra+ delivers exceptional flexibility for both large-area surveys and localized surface investigations. Its high-resolution XPS imaging capability enables visualization of the lateral distribution of surface components, while targeted small-area analysis allows detailed examination of specific features or regions of interest. Furthermore, its modular architecture supports optional surface preparation and complementary analytical techniques, expanding characterization capabilities while maintaining the reliability and performance of XPS analysis.

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Key FeaturesTechnical SpecificationsApplications

High Sensitivity for Efficient Surface Analysis
The AXIS Supra+ delivers outstanding sensitivity in both spectroscopic and XPS imaging modes, enabling rapid acquisition of high-quality data while minimizing X-ray exposure. Its high signal-to-noise performance facilitates reliable detection and quantification of low-concentration species as well as light elements with relatively low photoelectron cross-sections, making it well suited for demanding surface characterization tasks.
High-Resolution Spectroscopy and Parallel XPS Imaging
The system combines excellent energy resolution with fast, high-spatial-resolution parallel XPS imaging, allowing accurate identification of subtle chemical shifts and visualization of elemental and chemical state distributions across material surfaces. Quantitative chemical imaging and selected-area spectroscopy enable efficient investigation of localized features without compromising analytical performance.
Intelligent Automation and User-Friendly Operation
Integrated ESCApe software streamlines instrument control by combining data acquisition, processing, and interpretation within a single platform. Automated sample exchange, predefined analytical workflows, and computer-controlled instrument functions improve operational efficiency, support unattended analysis, and ensure highly reproducible results for both routine testing and advanced research.
Flexible Platform for Advanced Surface Characterization
Designed with a modular architecture, the AXIS Supra+ can be configured with additional analytical and surface preparation techniques, including UPS, ISS, HAXPES, AES, EDX, REELS, and ion sputtering—without compromising XPS performance. This flexibility enables comprehensive characterization of complex materials and evolving surface phenomena within a single analytical platform.

Parameter	Specification
XPS Energy Scan Range	0–3200 eV
UPS Energy Scan Range	0–65 eV
Minimum Energy Step Size	4 meV (XPS); 1.5 meV (UPS)
X-ray Beam Size	>500 μm (large-area analysis);<20 μm (micro-area analysis)
Monochromatic Al Kα XPS Energy Resolution / Sensitivity	Up to 0.5 eV energy resolution with optimized sensitivity*
Non-monochromatic Al/Mg XPS	Energy resolution down to 0.8 eV*
Insulator Analysis Capability	High-resolution analysis with advanced charge compensation

*Performance varies depending on the selected X-ray beam size and operating conditions.

The Shimadzu Kratos AXIS Supra+ XPS is widely used for quantitative surface characterization across scientific research and industrial applications. By measuring the elemental composition and chemical states within the outermost surface of a material, it provides essential information for understanding surface chemistry, interfaces, and functional coatings. Typical applications include:

Surface elemental composition and quantitative analysis
Chemical state and oxidation state determination
Surface composition depth profiling in combination with ion sputtering
Quantitative measurement of surface elemental concentrations
High-resolution chemical state imaging and elemental distribution mapping
Surface contamination, corrosion, and cleanliness analysis

The system is extensively applied in materials science, chemistry, chemical engineering, semiconductors, energy materials, catalysis, polymers, biotechnology, pharmaceuticals, and advanced manufacturing, supporting research, process development, quality control, and failure investigation.

The addition of the Shimadzu Kratos AXIS Supra+ XPS significantly strengthens laboratory's surface analysis capabilities by providing accurate, quantitative characterization of elemental composition and chemical states at the nanoscale surface. Combined with high-resolution spectroscopic analysis, chemical imaging, and flexible analytical workflows, the instrument enables comprehensive investigation of complex material surfaces, interfaces, and thin films, and supports materials research, process optimization, product qualification, contamination analysis, and failure investigation.

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