Photomask Metrology & Inspection Services

In semiconductor manufacturing, photomasks are the foundational master plates that define the circuit patterns printed onto wafers through lithography. As device geometries continue to shrink toward the single–nanometer scale and multi-layer mask stacks become standard in advanced nodes, even a nanometer-level linewidth shift or a single particle contamination on a mask can be amplified across millions of chips. This makes photomask metrology and inspection no longer a supporting task—it is a critical gatekeeper of yield, reliability, and production economics. At Alfa Chemistry, we are committed to delivering precision, reliability, and technological excellence in every stage of chip manufacturing. Our photomask metrology & inspection services provide a comprehensive quality-assurance solution for semiconductor fabs, foundries, IC design houses, and research institutions worldwide. Equipped with industry-leading metrology tools, automated inspection platforms, and an experienced engineering team, we ensure that every photomask meets strict global standards for dimensional accuracy, pattern integrity, surface cleanliness, and defect-free quality.

Our primary test categories include:

Each measurement result is delivered with high-precision data reports, defect maps, statistical process capability charts, and expert engineering recommendations.

Our services support both standard and highly customized photomasks:

• Binary chrome masks (Cr Masks)
• Attenuated / alternating phase-shift masks (PSM / Alt-PSM / Att-PSM)
• EUV photomasks (Reflective multilayer masks, absorber defects, pellicle inspection)
• Embedded attenuated PSM (E-PSM) for Sub-90 nm semiconductor nodes
• LCD / OLED display masks (large-area masks, FMM mask inspection)
• Micro-LED, MEMS, advanced optics & scientific-grade masks
• Substrates from 5-Inch to gen-8 large plate formats
• ...

We use world-class metrology and inspection equipment to provide highly accurate testing:

• CD-SEM (critical dimension SEM)
• High-resolution optical mask inspection system (AIMS-EUV / UV-AIMS)
• Laser scanning mask defect inspector
• Registration metrology system (e.g., Leica LMS / KLA registration tools)
• White-light interferometer
• Spectroscopic ellipsometer
• Atomic force microscope (AFM)
• DUV pellicle inspection tool
• Surface particle counter (Laser-based)
• UV-laser stress analyzer
• SEM-EDX material analyzer

All tools operate within controlled Class-1–Class-100 cleanroom environments to prevent contamination and guarantee metrology repeatability.

Why choose us?

• Ultra-High Precision & International-Standard Data Quality: Sub-nanometer metrology resolution and calibration traceable to international semiconductor standards ensure accurate, audit-grade test results.
• Fast Turnaround & Flexible Service Models: Optional 24-hour express service, batch-based subscription inspection, and mask lifetime monitoring programs.
• Beyond Data — Professional Engineering Interpretation: We don't just provide raw measurement values; our engineers analyze root-cause risks, recommend process corrections, and support mask re-qualification.
• Confidential & Traceable Handling: NDA-protected data flow, secure server-side report delivery, and full mask traceability throughout logistics and testing.
• Global Support Network: Regional service centers in Asia, Europe, and North America enable fast communication and localized technical response.