Copy Mask-making Service

What are copy masks?

A copy mask refers to a newly manufactured photomask reproduced from an existing master mask. It is typically used when:

• The original mask has degraded due to usage, particles, or mechanical scratches.
• Expansion of production volume requires additional sets of identical masks.
• Original design data or GDS files are unavailable or incomplete.
• A customer needs to replicate legacy nodes or maintain long-term product supply.

Copy masks allow chip manufacturers to extend the usable lifetime of lithographic tooling, preserve older design IP, and operate fabs without interruption, particularly in mature process nodes such as 180nm, 130nm, and 90nm, as well as specialty applications like power devices, sensors, LED, IC packaging, and TFT-LCD. The process of copy mask involves scanning the original mask, extracting pattern information, compensating distortion, and writing data onto new blanks using photomask writing equipment.

At Alfa Chemistry, we provide end-to-end solutions to support customers in extending product life cycles, maintaining line stability, and ensuring seamless production continuity. Our copy mask-making service is designed to offer fast turnaround, flexible customization, and superior data integrity, backed by cutting-edge optical writing systems and world-class quality control.

We deliver a comprehensive copy mask-making package (including but not limited to):

• 1:1 Mask Copying: Direct duplication from a master photomask, including opaque patterns, chrome masks, and partially transparent patterns.
• Optical Data Capture & Pattern Reconstruction: High-resolution pattern scanning with distortion correction to restore integrity from worn-out or aged masks.
• Partial Copy or Layer-specific Mask Regeneration: Selective duplication of individual layers when only part of a stack mask needs replacement.
• Mask Repair & Life-extension: Minor scratch/pin-hole repair to avoid full mask recreation, helping customers reduce cost.

Each service is delivered under strict confidentiality agreements to protect customer IP and ensure secure handling of mask assets. Meanwhile, we will convert mask patterns into a secure digital format (GDS/OASIS) for long-term storage and future mask replication.

Our copy mask-making capabilities cover a broad range of photomask specifications:

Our copy mask-making capabilities cover a broad range of photomask types, size formats, substrate materials, and write-grid resolutions, enabling us to meet the diverse needs of global semiconductor customers.