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X-ray photoelectron spectroscopy (XPS) is a surface-sensitive quantitative spectroscopic technique that measures the elemental composition at the parts per thousand range, empirical formula, chemical state and electronic state of the elements that exist within a material. XPS spectra are obtained by irradiating a material with a beam of X-rays while simultaneously measuring the kinetic energy and number of electrons that escape from the top 0 to 10 nm of the material being analyzed. This multi-technique with photoelectron and ion spectroscopies, including surface-mapping capabilities, can help with surface elemental and composition analysis.
Applications
High energy resolution
High detection sensitivity
Spectral snapshot (Snapshot) function
Key Features
Key Features-AXIS Ultra DLD
Signal detected
Photoelectron from near surface atoms
Elements detected
From Lithium to heavy metals
Detection limits
0.1 to 1 atomic%
Depth resolution
2 to 8nm
Depth Profile
0.5 nm/second using Argon ions
Lateral resolution
15 to 500 microns
Functions
X-ray photoelectron spectroscopy (XPS) provides information on elemental composition and chemical bonding states of materials.
Ultraviolet photoelectron spectroscopy (UPS) provides information on valence levels and work function measurements of materials.
Low energy Ion Scattering spectroscopy (ISS) provides provide evaluation of the elemental composition and structure of solid surfaces.
XPS mode is also capable of surface mapping to provide lateral distribution maps of elemental and chemical species at the surface.