Application
The purpose of the Scandium Sputtering Target is to provide a material with high purity, precisely 99.9%, for advanced surface coating and thin-film applications. Its black hexagonal crystalline structure in a -20 mesh form ensures optimal consistency and performance. Additionally, the inclusion of tantalum in the range of 1% to 3% enhances its properties for specialized sputtering processes, making it suitable for demanding environments and high-tech industries.