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Inductively coupled plasma (ICP) as a kind of the atom spectrum analysis technique began in the 1960s, and by the 1980s, theory and application entered its mature stage. It is an analytical technique mainly used for the detection of trace metals. ICP-OES is a type of emission spectroscopy that uses the inductively coupled plasma (argon) to produce excited atoms and ions that emit electromagnetic radiation at wavelengths characteristic of a particular element. The intensity of this emission is indicative of the concentration of the element within the sample. The sensitivity of this technique is quite high, varying by element, from 1ppm to 10ppb.