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Tantalum(V) ethoxide
Catalog Number
ACM6074846-2
Product Name
Tantalum(V) ethoxide
Structure
![{[CurrentData.Name]}](https://resource.alfachemic.com/structure/6074-84-6.gif)
CAS
6074-84-6
Synonyms
PET,Pentaethoxytantalum,Pentaethyl tantalate,Tantalum pentaethoxide
IUPAC Name
ethanolate;tantalum(5+);
Molecular Weight
406.25
Molecular Formula
Ta(OC2H5)5
Canonical SMILES
CCO[Ta](OCC)(OCC)(OCC)OCC
InChI
1S/5C2H5O.Ta/c5*1-2-3;/h5*2H2,1H3;/q5*-1;+5,HSXKFDGTKKAEHL-UHFFFAOYSA-N
InChI Key
HSXKFDGTKKAEHL-UHFFFAOYSA-N
Melting Point
21 °C (lit.)
Storage
2-8°C
Complexity
2.8
Covalently-Bonded Unit Count
6
EC Number
228-010-2
Exact Mass
406.118g/mol
H-Bond Acceptor
5
Heavy Atom Count
16
MDL Number
MFCD00049785
Monoisotopic Mass
406.118g/mol
Topological Polar Surface Area
115A^2
Application
Tantalum(V) ethoxide serves as a versatile precursor for creating tantalum oxide thin films through techniques such as chemical vapor deposition, atomic layer deposition, and sol-gel processing. These thin films play a vital role in the semiconductor, electrochromic, and optical industries. Additionally, Tantalum(V) ethoxide is utilized in research for synthesizing novel compounds with unique molecular structures, such as oxo-alkoxide-carboxylates. Furthermore, it aids in the preparation of tantalum oxide nanoparticles, which are valuable for imaging applications in cartilage. Known for its excellent volatility and thermal stability, this compound is typically synthesized by anodic oxidation of tantalum in anhydrous ethanol.
January 27, 2025
Efficient Precursor for Tantalum Oxide Films
Using Alfa Chemistry's Tantalum(V) ethoxide in our lab, we achieved precise tantalum oxide layers through ALD and CVD. The high volatility ensured smooth deposition. Ideal for semiconductors, this product is reliable and easy to handle.
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