NAVIGATION
Efficient Precursor for Tantalum Oxide Films
Using Alfa Chemistry's Tantalum(V) ethoxide in our lab, we achieved precise tantalum oxide layers through ALD and CVD. The high volatility ensured smooth deposition. Ideal for semiconductors, this product is reliable and easy to handle.
Tantalum Carbide Nanoparticles / Nanopowder (12070-06-3)
Tris(ethylmethylamido)(tert-butylimido)tantalum(V) (511292-99-2)
Tantalum(V) methoxide (865-35-0)
Tantalum(V) fluoride (7783-71-3)
Tantalum(V) butoxide (51094-78-1)
Tantalum (7440-25-7)