CAS 12024-21-4 Gallium(III) oxide - Catalysts / Alfa Chemistry

Application

Gallium(III) oxide (Ga2O3) is a versatile material widely utilized in advanced technological applications due to its unique properties as a wide band gap semiconductor within the family of transparent semiconducting oxides. It can exist in various polymorphic forms and is prepared using methods such as chemical vapor deposition and molecular beam epitaxy. This material serves critical roles across diverse fields, including optoelectronics, chemical sensing, and catalysis. Key applications involve its use in semiconductor devices, field-effect transistors, and as a crucial component in gas sensors and luminescent phosphors. Ga2O3's potential in deep-ultraviolet transparent conductive oxides and in power electronic devices is particularly noteworthy, providing solutions for ultrahigh-voltage power switching. Its ability to form thin films and glasses with gas-sensitive properties makes it desirable for both commercial and advanced optical technologies. Additionally, gallium oxide's integration into vacuum deposition processes, semiconductor production, and fabrication of electroluminescent devices further underscores its significance. Its high laser damage threshold and moderate conductivity make it suitable for applications like laser-driven electron accelerators and low-loss plasmonics, highlighting its capability as an effective catalyst and a starting material for complex compounds.