Application
Bis(dimethylamino)dimethylsilane is a versatile compound primarily used for the chemical vapor deposition of silicon nitride films and the deposition of SiNxCy dielectric sealing layers using plasma-enhanced atomic layer deposition (PE-ALD). Its applications extend to serving as a silylation reagent and enhancing processes like the silanization of pH-sensitive microelectrodes, which are crucial for measuring membrane potential in oocytes. This compound plays a key role in experimental procedures focused on cloning and characterizing human electrogenic Na+-cotransporter isoform (hhNBC). Additionally, it is utilized in studies measuring carbon dioxide transport through membranes and is instrumental in various electronic film deposition processes.