CAS 3768-58-9 Bis(Dimethylamino)Dimethylsilane

IUPAC Name

N-[dimethylamino(dimethyl)silyl]-N-methylmethanamine

Molecular Weight

146.31 g/mol

Molecular Formula

C6H18N2Si

Canonical SMILES

CN(C)[Si](C)(C)N(C)C

InChI

InChI=1S/C6H18N2Si/c1-7(2)9(5,6)8(3)4/h1-6H3

InChI Key

QULMGWCCKILBTO-UHFFFAOYSA-N

Boiling Point

128 °C

Flash Point

-7 °C

Purity

>97%

Density

0.81 g/mL

Appearance

Colorless to almost colorless clear liquid

Storage

Store under inert gas

Complexity

79.1

Covalently-Bonded Unit Count

EC Number

223-200-1

Exact Mass

146.123925g/mol

Formal Charge

H-Bond Acceptor

H-Bond Donor

Heavy Atom Count

MDL Number

MFCD00008296

Monoisotopic Mass

146.123925g/mol

Rotatable Bond Count

Application

Bis(dimethylamino)dimethylsilane is a versatile compound primarily used for the chemical vapor deposition of silicon nitride films and the deposition of SiNxCy dielectric sealing layers using plasma-enhanced atomic layer deposition (PE-ALD). Its applications extend to serving as a silylation reagent and enhancing processes like the silanization of pH-sensitive microelectrodes, which are crucial for measuring membrane potential in oocytes. This compound plays a key role in experimental procedures focused on cloning and characterizing human electrogenic Na+-cotransporter isoform (hhNBC). Additionally, it is utilized in studies measuring carbon dioxide transport through membranes and is instrumental in various electronic film deposition processes.

March 21, 2025

Essential Reagent for High-Precision Research

Bis(Dimethylamino)Dimethylsilane is an excellent choice for deposition and silylation applications. Its role in silicon nitride film deposition and microelectrode work significantly enhanced our research outcomes with precise and reliable results.